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The Chinese have created a fully domestic installation for several key stages of chip production
China Electronics Technology Group Announces Successful Manufacturing of Fully Domestic Ion Implantation Machine. This was another breakthrough on the path to independent manufacturing of industrial equipment for the production of chips and mitigation of the impact of sanctions.
Image Source: China Electronics Technology Group
Devices for ion implantation in the semiconductor industry are used both for creating films and for doping (introducing impurities) into the working layers of future microcircuits. Penetration depth varies depending on the power of the ion beam. A China Electronics Technology unit with a maximum beam power of 6 million electron-volts is designed for medium to deep exposure.
Using the new setup allows Chinese chip makers to produce semiconductors up to 28nm. To organize the production of products according to finer technical processes, China remains dependent on foreign equipment manufacturers, in particular, on German ones, if we talk about the niche of ion implantation.